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所有的文献@标签 silicon [200 articles]

当前文献的标签分类为: silicon.
  • A continuous-wave Raman silicon laser
    Nature, Vol. 433, No. 7027. (17 February 2005), pp. 725-728.
    by Haisheng Rong, Richard Jones, Ansheng Liu, Oded Cohen, Dani Hak, Alexander Fang, Mario Paniccia
    posted to laser raman silicon by yanfeng on 2005-02-21 08:54:06 as ***** along with 3 people chrisada kristgy eyliu
  • Influence of the Substrate Resistivity on the Broadband Propagation Characteristics of Silicon Transmission Lines
    ARFTG Conference Digest-Spring, 54th, Vol. 36 (1999), pp. 65-70.
    by Uwe Arz, Hartmut Grabinski, Dylan F Williams
    posted to broadband p_tmlm resistivity silicon substrate transmission by thmsdmstr on 2007-12-14 08:05:52 as **
  • Thin gate oxide behavior during plasma patterning of silicon gates
    Applied Physics Letters, Vol. 75, No. 8. (1999), pp. 1069-1070.
  • Silicon doping effects in reactive plasma etching
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 4, No. 2. (1986), pp. 468-475.
    by Young H Lee, Mao M Chen
    posted to silicon plasma etching doping by these_morel on 2008-09-16 15:30:03 as **
  • Sub-0.1 mu m gate etch processes: Towards some limitations of the plasma technology?
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 18, No. 1. (2000), pp. 156-165.
    posted to oxidation recess silicon xps by these_morel on 2008-03-05 08:58:33 as read
  • Influence of reactor walls on plasma chemistry and on silicon etch product densities during silicon etching processes in halogen-based plasmas
    Plasma Sources Science and Technology, Vol. 13, No. 3. (2004), pp. 522-530.
    posted to absorption cl2 cl2-o2 dissociation etching parois plasma silicon by these_morel on 2008-03-05 09:13:22 as read
  • Reduction of silicon recess caused by plasma oxidation during high-density plasma polysilicon gate etching
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 5. (2003), pp. 2205-2211.
    by SA Vitale, BA Smith
  • Silicon etching mechanisms in a CF[sub 4]/H[sub 2] glow discharge
    Journal of Applied Physics, Vol. 62, No. 2. (1987), pp. 662-672.
    by Gottlieb S Oehrlein, Holly L Williams
    posted to silicon fluorocarbon etching cf4 by these_morel on 2008-09-04 13:20:25 as **
  • Influence of the reactor wall composition on radicals' densities and total pressure in Cl[sub 2] inductively coupled plasmas: II. During silicon etching
    Journal of Applied Physics, Vol. 102, No. 9. (2007)
    by G Cunge, N Sadeghi, R Ramos
    posted to absorption cl2 dissociation etching parois plasma silicon xps by these_morel on 2008-03-05 09:18:49 as read
  • notes Ion flux composition in HBr/Cl[sub 2]/O[sub 2] and HBr/Cl[sub 2]/O[sub 2]/CF[sub 4] chemistries during silicon etching in industrial high-density plasmas
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, No. 5. (2002), pp. 2137-2148.
  • Solution-processed silicon films and transistors
    Nature, Vol. 440, No. 7085., pp. 783-786.
    by Tatsuya Shimoda, Yasuo Matsuki, Masahiro Furusawa, Takashi Aoki, Ichio Yudasaka, Hideki Tanaka, Haruo Iwasawa, Daohai Wang, Masami Miyasaka, Yasumasa Takeuchi
    posted to processing silicon solution by srsdent on 2006-04-06 02:46:10 as ***
  • Vacancy in silicon: Hyperfine interactions from electron-nuclear double resonance measurements
    Physical Review B, Vol. 35, No. 4. (1 February 1987), 1566.
    by M Sprenger, SH Muller, EG Sieverts, CAJ Ammerlaan
    posted to endor hyperfine interactions silicon vacancies by sieeg on 2006-10-10 14:45:34 as read
  • A Porous Silicon Optical Biosensor: Detection of Reversible Binding of IgG to a Protein A-Modified Surface
    J. Am. Chem. Soc., Vol. 121, No. 34. (1 September 1999), pp. 7925-7930.
    by KPS Dancil, DP Greiner, MJ Sailor
    posted to proteins sensor silicon by sharpstones on 2007-03-22 17:51:28 as ***
  • Macroporous Silicon Microcavities for Macromolecule Detection
    Advanced Functional Materials, Vol. 15, No. 11. (2005), pp. 1851-1859.
    by H Ouyang, M Christophersen, R Viard, B L Miller, P M Fauchet
    posted to organicsproject protein sensor silicon by sharpstones on 2007-03-22 17:54:27 as read
  • Fabrication of sub-0.5 micron diameter cobalt dots on silicon substrates and photoresist pedestals on 50 cm × 50 cm glass substrates using laser interference lithograph
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 3, May 1996, pp.2005-2007, Vol. 14 (May 1996), pp. 2005-2007.
    by JP Spallas, RD Boyd, JA Britten, A Fernandez, AM Hawryluk, MD Perry, DR Kania
  • Nonlinear optical properties and surface-plasmon enhanced optical limiting in Ag--Cu nanoclusters co-doped in SiO[sub 2] Sol-Gel films
    Journal of Applied Physics, Vol. 96, No. 11. (2004), pp. 6717-6723.
    by Prem P Kiran, Shivakiran BN Bhaktha, Narayana D Rao, Goutam De
  • Vacuum ultraviolet thin films. 1: Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films
    Appl. Opt., Vol. 29, No. 28. (1 October 1990), pp. 4284-4292.
    by Muamer Zukic, Douglas G Torr, James F Spann, Marsha R Torr
  • Raman spectra and optical trapping of highly refractive and nontransparent particles
    Applied Physics Letters, Vol. 81 (August 2002), pp. 951-953.
    by C Xie, Li
  • The foundation of the silicon age
    Physics Today, Vol. 50 (December 1997), pp. 34-39.
    by IM Ross
    posted to physics silicon wwii by rodney on 2008-02-11 01:57:21 as **
  • Local near-field enhancement of random Sb-SiN films
    Appl. Opt., Vol. 43, No. 15. (2004), pp. 3073-3077.
    by DR Ou, J Zhu, RJ Zhu, J Wang
  • Silicon carbide UV photodiodes
    Electron Devices, IEEE Transactions on, Vol. 40, No. 2. (1993), pp. 325-333.
    by DM Brown, ET Downey, M Ghezzo, JW Kretchmer, RJ Saia, YS Liu, JA Edmond, G Gati, JM Pimbley, WE Schneider
    posted to carbide photodiodes silicon ultraviolet uv by rodney on 2008-07-27 22:35:01 as **
  • Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water
    Applied Physics Letters, Vol. 66, No. 20. (1995), pp. 2655-2657.
    by Hideo Namatsu, Kenji Kurihara, Masao Nagase, Kazumi Iwadate, Katsumi Murase
  • Surface adhesion reduction in silicon microstructures using femtosecond laser pulses
    Applied Physics Letters, Vol. 68 (January 1996), pp. 197-199.
    by NC Tien, S Jeong, LM Phinney, K Fushinobu, J Bokor
  • Neutron Reflectivity and Atomic Force Microscopy Studies of a Lipid Bilayer in Water Adsorbed to the Surface of a Silicon Single Crystal
    Langmuir, Vol. 12, No. 5. (6 March 1996), pp. 1343-1350.
    by BW Koenig, S Krueger, WJ Orts, CF Majkrzak, NF Berk, JV Silverton, K Gawrisch
  • Spectroscopic and nonlinear characteristics of anthracene-containing silicon-organic polymers in solution
    J Lumin, Vol. 105, No. 2-4. (2003), pp. 81-87.
    posted to anthracene silicon spectroscopy by rodney on 2007-03-30 15:35:27 as ** along with 1 group Kopelman_Group
  • Pump-probe imaging of femtosecond pulsed laser ablation of silicon with thermally grown oxide films
    Journal of Applied Physics, Vol. 102, No. 6. (2007)
    by Joel P Mcdonald, John A Nees, Steve M Yalisove
    posted to iron fe films ablation oxide pump-probe silicon ultrafast by rodney on 2008-02-12 00:26:01 as **
  • Optical properties of nanoscale, one-dimensional silicon grating structures
    Journal of Applied Physics, Vol. 80, No. 12. (1996), pp. 6997-7008.
    by Saleem H Zaidi, An S Chu, SRJ Brueck
    posted to 1-d nanoscale optical silicon by rodney on 2007-09-03 21:19:40 as ** along with 1 group Kopelman_Group
  • Silicon nanowires prepared by laser ablation at high temperature
    Applied Physics Letters, Vol. 72, No. 15. (1998), pp. 1835-1837.
    by YF Zhang, YH Tang, N Wang, DP Yu, CS Lee, I Bello, ST Lee
    posted to ece559 nanowire vls silicon by Quarem on 2008-02-12 16:28:08 as **
  • Patterned epitaxial vapor-liquid-solid growth of silicon nanowires on Si(111) using silane
    Journal of Applied Physics, Vol. 103, No. 2. (2008)
    by H Schmid, MT Björk, J Knoch, H Riel, W Riess, P Rice, T Topuria
    posted to ece559 nanowire vls silicon by Quarem on 2008-02-15 22:50:58 as **
  • Growth of silicon nanowires via gold/silane vapor--liquid--solid reaction
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 15, No. 3. (1997), pp. 554-557.
    by J Westwater, DP Gosain, S Tomiya, S Usui, H Ruda
    posted to ece559 nanowire vls silicon by Quarem on 2008-02-12 16:22:26 as **
  • A Combined Top-down and Bottom-up approach for Precise Placement of Metal Nanoparticles on Silicon
    Small, Vol. 9999, No. 9999. (2008), NA.
    by W K Choi, T H Liew, H G Chew, F Zheng, C V Thompson, Y Wang, M H Hong, X D Wang, L Li, J Yun
    posted to ece559 nanowire silicon by Quarem on 2008-02-15 22:53:36 as **
  • In situ Ni--Si nanowire junction based on substrate sourced growth and its electrical transport behavior
    Applied Physics Letters, Vol. 90, No. 25. (2007)
    by Yun H Lee, Hyuk S Kwon
    posted to ece559 nanowire silicon by Quarem on 2008-02-15 23:16:59 as **
  • Complementary Metal-Oxide-Semiconductor Compatible Al-Catalyzed Silicon Nanowires
    Electrochemical and Solid-State Letters, Vol. 10, No. 6. (2007), pp. E11-E13.
    by SJ Whang, SJ Lee, WF Yang, BJ Cho, YF Liew, DL Kwong
    posted to ece559 nanowire silicon by Quarem on 2008-02-15 23:14:37 as **
  • Silicon whisker growth and epitaxy by the vapour-liquid-solid mechanism
    British Journal of Applied Physics, Vol. 16, No. 8. (1965), pp. 1089-1094.
    by DWF James, C Lewis
    posted to ece559 nanowire vls silicon by Quarem on 2008-03-28 21:36:38 as **
  • Growth of SiOx nanowires by laser ablation
    Nanotechnology, Vol. 19, No. 6. (2008), 065608.
    by Igor Aharonovich, Shoshana Tamir, Yeshayahu Lifshitz
    posted to ece559 nanowire silicon by Quarem on 2008-02-15 23:19:54 as **
  • Wet etching of silicon gratings with triangular profiles
    Microsystem Technologies, Vol. 11, No. 12. (28 November 2005), pp. 1287-1291.
    posted to ece559 silicon by Quarem on 2008-04-18 09:07:51 as **
  • Melting of square crystals in two dimensions
    Physical Review E, Vol. 48, No. 6. (December 1993), 4351.
    by Thomas A Weber, Frank H Stillinger
    posted to md silicon by ptupper on 2007-09-07 19:42:00 as **
  • Computer simulation of local order in condensed phases of silicon
    Physical Review B, Vol. 31, No. 8. (15 April 1985), 5262.
    by Frank H Stillinger, Thomas A Weber
    posted to silicon by ptupper on 2007-09-07 19:40:21 as ** along with 1 person and_ped10
  • Semiconducting Surface Reconstructions of p-Type Si(100) Substrates at 5 K
    Physical Review Letters, Vol. 92, No. 21. (27 May 2004), 216101.
    posted to silicon stm sts uhv by perdigao1 on 2008-07-21 18:15:11 as **
  • Electron Transport via Local Polarons at Interface Atoms
    Physical Review Letters, Vol. 97, No. 20. (2006)
    by M Berthe, A Urbieta, Perdig\ L Ao, B Grandidier, D Deresmes, C Delerue, D Stiévenard, R Rurali, N Lorente, L Magaud, P Ordejón
    posted to boron silicon stm sts uhv by perdigao1 on 2008-07-21 17:44:47 as **
  • Surface self-assembly of the cyanuric acid-melamine hydrogen bonded network
    Chem. Commun., No. 5. (2006), pp. 538-540.
    by Luis M Perdigao, Neil R Champness, Peter H Beton
    posted to acid cyanuric melamine silicon silver stm by perdigao1 on 2008-07-21 17:12:00 as **
  • Scanning tunneling microscopy and spectroscopy of reconstructed Si(100) surfaces
    Physical Review B (Condensed Matter and Materials Physics), Vol. 71, No. 16. (2005)
    by M Dubois, Perdig\ L Ao, C Delerue, G Allan, B Grandidier, D Deresmes, D Stiévenard
    posted to reconstruction silicon stm sts by perdigao1 on 2008-07-21 17:46:50 as **
  • Hall effect and ionized impurity scattering in Si[sub (1 - x)]Ge[sub x]
    Journal of Applied Physics, Vol. 94, No. 11. (2003), pp. 7159-7162.
    by P Kinsler, Th
  • Challenges and Solutions for Late- and Post-Silicon Design
    IEEE Design and Test of Computers, Vol. 25, No. 4. (2008), pp. 296-302.
    by Jan M Rabaey, Sharad Malik
    posted to review semiconductor silicon trend by mrsmond on 2008-08-06 12:12:43 as read
  • A finite-element model of the mechanical effects of implantable microelectrodes in the cerebral cortex.
    J Neural Eng, Vol. 2, No. 4. (December 2005), pp. 103-113.
    by J Subbaroyan, DC Martin, DR Kipke
  • Nanoscale neuro-integrative coatings for neural implants.
    Biomaterials, Vol. 26, No. 16. (June 2005), pp. 2983-2990.
    by W He, RV Bellamkonda
  • Chronic recording capability of the Utah Intracortical Electrode Array in cat sensory cortex.
    J Neurosci Methods, Vol. 82, No. 1. (1 July 1998), pp. 1-15.
    by PJ Rousche, RA Normann
  • Implantable neural probe systems for cortical neuroprostheses
    Engineering in Medicine and Biology Society, 2004. EMBC 2004. Conference Proceedings. 26th Annual International Conference of the, Vol. 2 (2004), pp. 5344-5347 Vol.7.
    by DR Kipke
  • Factors influencing the biocompatibility of insertable silicon microshafts in cerebral cortex.
    IEEE Trans Biomed Eng, Vol. 39, No. 6. (June 1992), pp. 635-643.
    by DJ Edell, VV Toi, VM McNeil, LD Clark
  • A high-yield microassembly structure for three-dimensional microelectrode arrays
    Biomedical Engineering, IEEE Transactions on, Vol. 47, No. 3. (2000), pp. 281-289.
    by Qing Bai, KD Wise, DJ Anderson
    posted to implant neural recording silicon by mrjpharris on 2006-06-09 17:47:51 as read
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